Burn J. Lin

Burn J. Lin became a vice president at TSMC, Ltd., in 2011. He joined TSMC in 2000 as a senior director. Prior to that, he founded Linnovation, Inc. in 1992. Earlier he held various technical and managerial positions at IBM after joining IBM in 1970. He has been extending the limit of optical lithography for close to four decades. He pioneered many lithography techniques, among them deep-UV lithog- raphy starting from 1975, multi-layer resist from 1979, Exposure-Defocus method- ology from 1980, k1 reduction from 1987, attenuated phase-shifting mask from
1991, 193 nm immersion lithography from 2002, and polarization-dependent stray
light from 2004. He is currently working on cost-effective optical lithography and multiple-electron-beam mask-less lithography for the 20 nm node and beyond.
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Dr. Lin is the editor-in-chief of the Journal of Micro/nanolithography, MEMS, and MOEMS, life member of the US National Academy of Engineering, IEEE Life Fellow, and SPIE Fellow. He has received numerous awards, among them the 1st Semi IC Outstanding Achievement Award in 2010, the 2009 IEEE Cledo Brunetti Award, the 2009 Benjamin G. Lamme┬┤ Meritorious Achievement Medal, and in
2004 the 1st SPIE Frits Zernike award. Throughout his career, he has received numerous TSMC and IBM Awards. He has written one book and three book chapters, published 121 articles, mostly first-authored, and holds 66 US patents.


Dr. Burn J. Lin TSMC, 153 Kuang Fu Road, Sec. 1, Lane 89, 1st Fl, Hsinchu, Taiwan, R.O.C. 300, burnlin [at] tsmc.com.